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ion track : ウィキペディア英語版
ion track

Ion tracks are damage-trails created by swift heavy ions penetrating through solids, which may be sufficiently-contiguous for chemical etching in a variety of crystalline, glassy, and/or polymeric solids.
〕〔 They are associated with cylindrical damage-regions several nanometers in diameter〔
〕〔
〕 and can be studied by Rutherford backscattering spectrometry (RBS), transmission electron microscopy (TEM), small-angle neutron scattering (SANS), small-angle X-ray scattering (SAXS) or gas permeation.〔

==Ion track technology==
Ion track technology deals with the production and application of ion tracks in microtechnology and nanotechnology.〔
〕 Ion tracks can be selectively etched in many insulating solids, leading to cones or cylinders, down to 8 nanometers in diameter.〔
〕 Etched track cylinders can be used as filters,〔
〕〔
Coulter counter microchannels,〔
〕 be modified with monolayers,〔
〕 or be filled by electroplating.〔
〕〔

Ion track technology has been developed to fill certain niche areas where conventional nanolithography fails, including:
*Direct shaping of radiation-resistant minerals, glasses and polymers〔

*Generation of elongated structures with a resolution limit down to 8 nanometers〔
*Direct generation of holes in thin films without any development process〔

*Defining structural depth by ion range rather than by target thickness〔

*Generating structures with aspect ratio (depth divided by width) up to 104.〔
*Shaping rigid and flexible materials at a defined cutting angle〔

*Exploring the realm of aligned textures with defined inclination angles〔

*Generation of random patterns consisting of partially overlapping single tracks〔

*Generation of large numbers of individual single track structures〔

*Generation of aimed patterns consisting of individual single tracks〔


抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)
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